SMSE

Faculty, by Name

Zhuguo LI

Zhuguo LI

Platform:
Engineering Center of Materials Manufacturing
Title:
Professor
Office:
Room 203 Building E
Tel:
+86-21-3420¬-2837
Fax:
 
Email:
lizg@sjtu.edu.cn
URL:
 

Biographical Information

1990-1997  Shanghai Jiaotong University,  Student

1997-2010  Shanghai Jiaotong University,  Staff

2001-2004  Osaka University            Ph.D student

2005-2007  Osaka University            Researcher

Kinki University            Post doctor

 

Research Interests

Fundamentals of Materials Science;

Surface Science and technology;

 

Selected publications

[1]   Jiaming Ni, Zhuguo Li, Jian Huang, Yixiong Wu.  Strengthening behavior analysis of weld metal of laser hybrid welding for microalloyed steel.  Materials & Design: 31 (2010) 4876.

[2]   Kai Feng, Zhuguo Li, Xun Cai, Paul K. Chu.  Corrosion Behavior and Electrical Conductivity of Niobium Implanted 316L Stainless Steel Used as Bipolar Plates in Polymer Electrolyte Membrane Fuel Cells.  Surface and Coatings Technology: In Press.

[3]   Z.G. Li, S. Miyake, Characteristics of N-doped TiO2 thin films grown on unheated glass substrate by inductively coupled plasma assisted dc reactive magnetron sputtering, Applied Surface Science,255(2009)9149

[4]   Z.G. Li, Y.X. Wu, S. Miyake, Metallic sputtering growth of high quality anatase phase TiO2 films by inductively coupled plasma assisted DC reactive magnetron sputtering, Surface and Coating Technology, 203 (2009) 3661.

[5]   Z.G. Li, S. Miyake, M. Makino, Y.X. Wu, Microstructure and properties of nanocrystalline titanium monoxide films synthesized by inductively coupled plasma assisted reactive direct current magnetron sputtering, Applied Surface Science, 255 (2008) 2370.

[6]   Z.G. Li, S. Miyake, M. Makino, Y.X. Wu, Metallic sputtering growth of crystalline titanium oxide films on unheated glass substrate using inductively coupled plasma assisted direct current magnetron sputtering, Thin Solid Films, 517 (2008) 699.

[7]   Z.G. Li, S. Miyake, M. Makino, Y.X. Wu, Structure and properties of Ti–Si–N films with ~10 at.% Si deposited using reactive magnetron sputtering with high-flux low-energy ion assistance, Thin Solid Films, 516 (2008) 6548-6552.

[8]   Z.G. Li, S. Miyake, Y.X. Wu, Effect of low-energy ion irradiation on synthesis of hard and superhard films, Key Engineering Materials, 373-374 (2008) 172-175.