SMSE

Faculty, by Name

Xianping DONG

Xianping DONG

Platform:
Advanced Materials Research Center
Title:
Associate Professor
Office:
Room 405B, Material Building A
Tel:
+86-21-5474-7471
Fax:
 
Email:
xpdong@sjtu.edu.cn
URL:
 

Biographical Information

Education:

1985-1989:  B. S., Materials engineering, Nanchang University, P.R.China

1992-1995:  M. S., Material Engineering, School of Materials Science and Engineering, Harbin Institute of Technology, P.R. China

1998-2003:  Ph. D., Materials Science, School of Materials Science and Engineering, Shanghai Jiao Tong University, P.R.China

 

Professional Appointments:

2004 –     :  Associate Professor, School of Materials Science & Engineering, Shanghai Jiao Tong University, P.R.China

1995 – 2004:  Assistant Professor, School of Materials Science & Engineering, Shanghai Jiao Tong University, P.R.China

1989 – 1992:  Assistant engineer, Jiangxi Yongping Acid-resistant Pump Factory, P.R.China


Teaching Involvements

Powder Metallurgy

In perfect Crystal Structure and Its Analysis of Materials

New Techniques for Materials Fabrication

 

Selected Publications

[1] Xianping Dong, Bo Zhang and Jiansheng Wu. Optical-electrical properties and corrosion behavior of tantalum-doped indium tin oxide film deposited by magnetron sputtering. Materials Science Forum2010,638-642: 2897-2902

[2] Xianping Dong and Jiansheng Wu. The role of aluminum in the crystallization of Cr-Si-Ni  resistive films. Material Science and Engineering A, 2003,339(1/2): 297~301.

[3] Xianping Dong and Jiansheng Wu. The effect of zirconium on the crystallization behavior and electrical properties of Cr-Si-Al resistive films. Material Science and Engineering A, 2004,371(1/2): 1~8.

[4] Xianping Dong and Jiansheng Wu. Formation of an intermetallic phase by crystallization in Cr-Si-Ni-Al amorphous films. Journal of Alloys and Compounds, 2003359(1):256~260.

[5] Xianping Dong and Jiansheng Wu. The crystallization of Cr-Si-Ni-Al amorphous films: Nucleation and growth of intermetallic phase Cr(Al,Si)2. Intermetallics, 200311(8):779~785.

[6] Dong XP and Wu JS. Study on the crystallization of amorphous Cr-Si-Ni thin films using in situ X-ray diffraction.  J. Mater. Sci. Technol., 2001, 17: s43-46.

[7] Zhang B, Dong XP, Xu XF and Wu JS. Preparation and characterization of tantalum-doped indium tin oxide films deposited by magnetron sputtering, Scripta Materialia, 2008,58: 203-206

[8] Wang XJ, Dong XP, Wu JS. Effects of Cr dopant on the microstructure and electromigration performance of Cu interconnects. Applied Surface Science, 2009,255: 9273–9278