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Faculty

Name: Xianping DONG

Title: Associate Professor

Office: Room 405B, Material Building A

Tel: +86-21-5474-7471

Fax:

Email: xpdong@sjtu.edu.cn

URL:

Platform: Institute of High Performance Metal Materials

Introduction

Teaching Involvements
《Powder Metallurgy》
 《In perfect Crystal Structure and Its Analysis of Materials》
 《New Techniques for Materials Fabrication》

Biographical Information

Education:
 1985-1989:  B. S., Materials engineering, Nanchang University, P.R.China
 1992-1995:  M. S., Material Engineering, School of Materials Science and Engineering, Harbin Institute of Technology, P.R. China
 1998-2003:  Ph. D., Materials Science, School of Materials Science and Engineering, Shanghai Jiao Tong University, P.R.China

Professional Appointments:
 2004 –     :  Associate Professor, School of Materials Science & Engineering, Shanghai Jiao Tong University, P.R.China
 1995 – 2004:  Assistant Professor, School of Materials Science & Engineering, Shanghai Jiao Tong University, P.R.China
 1989 – 1992:  Assistant engineer, Jiangxi Yongping Acid-resistant Pump Factory, P.R.China

 

Research Interests

 《Powder Metallurgy》
 《In perfect Crystal Structure and Its Analysis of Materials》
 《New Techniques for Materials Fabrication》

 

Selected Publications

 [1] Xianping Dong, Bo Zhang and Jiansheng Wu. Optical-electrical properties and corrosion behavior of tantalum-doped indium tin oxide film deposited by magnetron sputtering. Materials Science Forum,2010,638-642: 2897-2902
 [2] Xianping Dong and Jiansheng Wu. The role of aluminum in the crystallization of Cr-Si-Ni  resistive films. Material Science and Engineering A, 2003,339(1/2): 297~301.
 [3] Xianping Dong and Jiansheng Wu. The effect of zirconium on the crystallization behavior and electrical properties of Cr-Si-Al resistive films. Material Science and Engineering A, 2004,371(1/2): 1~8.
 [4] Xianping Dong and Jiansheng Wu. Formation of an intermetallic phase by crystallization in Cr-Si-Ni-Al amorphous films. Journal of Alloys and Compounds, 2003,359(1):256~260.
 [5] Xianping Dong and Jiansheng Wu. The crystallization of Cr-Si-Ni-Al amorphous films: Nucleation and growth of intermetallic phase Cr(Al,Si)2. Intermetallics, 2003,11(8):779~785.
 [6] Dong XP and Wu JS. Study on the crystallization of amorphous Cr-Si-Ni thin films using in situ X-ray diffraction.  J. Mater. Sci. Technol., 2001, 17: s43-46.
 [7] Zhang B, Dong XP, Xu XF and Wu JS. Preparation and characterization of tantalum-doped indium tin oxide films deposited by magnetron sputtering, Scripta Materialia, 2008,58: 203-206
 [8] Wang XJ, Dong XP, Wu JS. Effects of Cr dopant on the microstructure and electromigration performance of Cu interconnects. Applied Surface Science, 2009,255: 9273–9278

 

Research Projects

Honors & Awards


800 Dongchuan Road, Minhang District, Shanghai, China Tel: +86-21-3420-3098