Introduction
Teaching Involvements
《Powder Metallurgy》
《In perfect Crystal Structure and Its Analysis of Materials》
《New Techniques for Materials Fabrication》
Biographical Information
Education:
1985-1989: B. S., Materials engineering, Nanchang University, P.R.China
1992-1995: M. S., Material Engineering, School of Materials Science and Engineering, Harbin Institute of Technology, P.R. China
1998-2003: Ph. D., Materials Science, School of Materials Science and Engineering, Shanghai Jiao Tong University, P.R.China
Professional Appointments:
2004 – : Associate Professor, School of Materials Science & Engineering, Shanghai Jiao Tong University, P.R.China
1995 – 2004: Assistant Professor, School of Materials Science & Engineering, Shanghai Jiao Tong University, P.R.China
1989 – 1992: Assistant engineer, Jiangxi Yongping Acid-resistant Pump Factory, P.R.China
Research Interests
《Powder Metallurgy》
《In perfect Crystal Structure and Its Analysis of Materials》
《New Techniques for Materials Fabrication》
Selected Publications
[1] Xianping Dong, Bo Zhang and Jiansheng Wu. Optical-electrical properties and corrosion behavior of tantalum-doped indium tin oxide film deposited by magnetron sputtering. Materials Science Forum，2010,638-642: 2897-2902
[2] Xianping Dong and Jiansheng Wu. The role of aluminum in the crystallization of Cr-Si-Ni resistive films. Material Science and Engineering A, 2003,339(1/2): 297~301.
[3] Xianping Dong and Jiansheng Wu. The effect of zirconium on the crystallization behavior and electrical properties of Cr-Si-Al resistive films. Material Science and Engineering A, 2004,371(1/2): 1~8.
[4] Xianping Dong and Jiansheng Wu. Formation of an intermetallic phase by crystallization in Cr-Si-Ni-Al amorphous films. Journal of Alloys and Compounds, 2003，359(1):256~260.
[5] Xianping Dong and Jiansheng Wu. The crystallization of Cr-Si-Ni-Al amorphous films: Nucleation and growth of intermetallic phase Cr(Al,Si)2. Intermetallics, 2003，11(8):779~785.
[6] Dong XP and Wu JS. Study on the crystallization of amorphous Cr-Si-Ni thin films using in situ X-ray diffraction. J. Mater. Sci. Technol., 2001, 17: s43-46.
[7] Zhang B, Dong XP, Xu XF and Wu JS. Preparation and characterization of tantalum-doped indium tin oxide films deposited by magnetron sputtering, Scripta Materialia, 2008,58: 203-206
[8] Wang XJ, Dong XP, Wu JS. Effects of Cr dopant on the microstructure and electromigration performance of Cu interconnects. Applied Surface Science, 2009,255: 9273–9278